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OAI 掩膜光刻機 Model 6000型的特點和優點

•高吞吐量（180 wph，**掩模模式)和生產和研發的*低運行成本

•ABO光學與光均質器，以實現所需各種電阻的分辨率和曝光

•用于大深度Foucs的特殊光學

•靈活處理基板從2“平方到12”平方

•可手動或自動上料

配置。

•系統配置頂部和/或底部側面/ IR 自動對準Vision ProR軟件

•適用于各種基材尺寸和類型

•基于Windows的軟件

•菜單驅動的GUI與工藝配方存儲

•全場曝光，提高吞吐量

•頂部加載口罩支架，方便，快速，安全的口罩更換

•可選全球調平零接觸處理

•雙臂4軸機器人搬運系統(可選)

•自調平工裝隔振

•**的服務支持(約95%的服務水平)

Mask Aligner - Model 6000 Features and Benefits

• High throughput (180 wph， first mask mode) and Lowest Cost of operation for production and R&D

• ABO Optics with light homogenizer to achieve required resolutions & exposures for various resists

• Special Optics for Large Depth of Foucs

• Flexibility with substrate handling from 2”sq to 12”sq

• Comes in manual loading or automated loading configurations.

• System configuration with top and/or bottom side / IR auto alignment with Cognex Vision ProR Software

• Adaptable to various substrate sizes and types

• Windows based software

• Menu driven GUI with process recipe storage

• Full field exposure for higher throughput

• Top load mask holder for easy， fast and safe mask replacements

• Optional Global leveling for zero contact processing

• Dual arm 4-axis robot handling system (optional)

• Self leveling tooling vibration isolation

• Superior service support (~95% service level)